Nanofabrication via Maskless Localized Atomic Layer Deposition of Patterned Nanoscale Metal Oxide Films

A modified open-air spatial atomic layer deposition (SALD) head is employed to fabricate complex oxide patterns on various substrates. The co-reactant being kept in the surrounding atmosphere, a simple injection that consists of three concentric nozzles with only one precursor outlet has been designed. Easy and reversible modification diameter metal permits direct patterning different lateral sizes. Maskless uniform homogenous TiO2 ZrO2 thin films successfully demonstrated resolution tuned from millimeters hundred micrometers range while keeping film thickness few hundreds nanometers control at nanoscale. This localized SALD approach, named LOCALD, also enables stacking structured